China’s regulatory framework for new chemical substance registration is entering a new phase of reform. With the Ecological and Environmental Code scheduled to take effect on 15 August 2026, the Measures for the Environmental Management Registration of New Chemical Substances (Draft Revision for Public Comment) signals a landmark and structural overhaul of the existing regime.
Rather than making limited adjustments to the current rules, the draft revision proposes a comprehensive redesign of the regulatory framework, covering key areas such as applicant eligibility, registration categories, exemption mechanisms, polymer regulation, inventory inclusion, supply chain obligations, post-registration supervision, and legal liabilities.
For companies operating in the chemical, pharmaceutical, agrochemical, cosmetics, advanced materials, and related supply chain sectors, these changes are expected to have a direct impact on registration strategies, compliance costs, market entry timelines, and internal compliance management frameworks. In particular, the proposed revisions concerning the application model for overseas enterprises, the removal of filing-based categories, the reshaping of polymer management rules, the linkage of the 1–10 ton registration requirements to national aggregate volume, and the strengthening of post-registration digital tracking and contractual responsibilities will require companies to reassess and upgrade their existing compliance systems.
In this webinar, we will examine the legislative background of the Ecological and Environmental Code alongside the key proposed changes in the draft revised measures. The session will provide a structured overview of the regulatory logic behind the reform, highlight the principal compliance risks and response priorities for businesses, and offer practical guidance on how companies can identify regulatory impacts early, optimize registration and supply chain compliance strategies, and prepare for the transition through internal planning and capability building.